STM STUDY OF GE OVERLAYERS ON SI(001)

被引:30
作者
IWAWAKI, F
TOMITORI, M
NISHIKAWA, O
机构
[1] Department of Materials Science and Engineering, The Graduate School at Nagatsuta, Tokyo Institute of Technology, Midori-ku, Yokohama, 227
关键词
D O I
10.1016/0039-6028(92)91034-9
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The structures of microscopically small Ge islands on the Si(001) surface were observed by an ultrahigh vacuum scanning tunneling microscope. After the Ge deposition of 0.1-0.2 monolayer (ML) on the Si substrate at 300-degrees-C, Ge islands composed of 1-5 dimer rows were observed. The observed structures indicated that the ordered arrangement of the buckled dimer rows varies with the number of dimer rows and that the position of a buckled Ge dimer has an interesting correlation with the position of a substrate Si dimer. A Ge dimer row separated by a missing dimer alternately was also observed. The stability of the Ge dimer row is discussed.
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页码:285 / 288
页数:4
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