Site-selective integration of monolayer-protected inorganic nanoparticles onto surface monolayer templates by a solvent-induced lift-off process

A simple approach for fabricating nanogranular film patterns composed of monolayer-protected inorganic nanoparticles onto surface monolayer templates was presented. Site-selective integration was achieved by selective lift-off of the granular films. This was accomplished due to penetration of solvents into the interface between the films and the monolayers on the substrates based on the polarity of the solvents and monolayers. The process provides an effective methodology for desirable integration of monolayer-protected inorganic nanoparticles through simple solution-based processing. The selective lift-off of the granular films on hydrophillic and hydrophobic surfaces could be achieved by washing with polar and nonpolar solvents, respectively, providing positive and negative patterns of the films on the surface. The results indicate the feasibility of a facile construction of various microfabricated devices due to the ability to selectively integrate the nanocomposites on a desired region through simple solution processing.