Subwavelength antireflection gratings for light emitting diodes and photodiodes fabricated by fast atom beam etching

被引：37

作者：

Ishimori, M ^{[1
]}

Kanamori, Y ^{[1
]}

Sasaki, M ^{[1
]}

Hane, K ^{[1
]}

机构：

[1] Tohoku Univ, Dept Mechatron & Precis Engn, Aoba Ku, Sendai, Miyagi 9808579, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2002年 / 41卷 / 6B期

关键词：

subwavelengh grating; antireflection; fast atom beam; light-emitting diode; photodiode;

D O I：

10.1143/JJAP.41.4346

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A two-dimensional antireflection subwavelangth-structured (SWS) surface is fabricated oil GaAlAs light-emitting diodes (LEDs) and photodiodes. The SWS is patterned by electron beam lithographs and etched by fast atom beams of SF, and Cl, gases. The SWS grating has a conical profile. 200 nm period and 270 nm groove depth, The emission intensity from this LED is 30% larger than that from the LED without a SWS grating at the peak emission wavelength. When this de-ice is used as a photodiode, the reflection reduced by the SWS surface increases both the short-circuit current and open-circuit Voltage, The SWS surface is useful as an antireflection structure improving the efficiency of the light emission of LEDs and the light detection of photodiodes.

引用

页码：4346 / 4349

页数：4

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