Micropatterning of ferroelectric Bi4Ti3O12 using electron-beam-induced reaction of metal octylate films

Micropatterning of ferroelectric Bi4Ti3O12 was carried out using an electron-beam-induced reaction of metal octylate films. Bismuth and titanium octylates were used as starting materials. Precursor solutions were prepared by mixing the octylates at a Bi : Ti molar ratio of 5.2 : 3.0 and diluting with acetone. The metal octylates exhibited negative exposure characteristics upon electron beam irradiation: a sensitivity of 1.5 x 10(-4) C/cm(2) and a gamma Value of 2. Precursor micropatterns were formed by electron beam irradiation on the spin-coated octylate films and successive development with toluene. The precursor micropatterns were calcined at 450 degrees C for 10 min and sintered at 800 degrees C for 30 min in air. A 65 x 80 mu m(2) precursor micropattern was crystallized into the single-phase of Bi4Ti3O12 by the heat treatment. Crystallized square micropatterns 1 mu m in size consisted of small platelike crystals.