Atomic oxygen surface loss coefficient measurements in a capacitive/inductive radio-frequency plasma

被引:89
作者
Gomez, S [1 ]
Steen, PG [1 ]
Graham, WG [1 ]
机构
[1] Queens Univ Belfast, Dept Pure & Appl Phys, Belfast BT7 1NN, Antrim, North Ireland
关键词
D O I
10.1063/1.1490630
中图分类号
O59 [应用物理学];
学科分类号
摘要
Spatially resolved measurements of the atomic oxygen densities close to a sample surface in a dual mode (capacitive/inductive) rf plasma are used to measure the atomic oxygen surface loss coefficient beta on stainless steel and aluminum substrates, silicon and silicon dioxide wafers, and on polypropylene samples. beta is found to be particularly sensitive to the gas pressure for both operating modes. It is concluded that this is due to the effect of changing atom and ion flux to the surface. (C) 2002 American Institute of Physics.
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收藏
页码:19 / 21
页数:3
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