Growth of silicon oxide in thin film block copolymer scaffolds

被引:57
作者
Kim, DH
Jia, XQ
Lin, ZQ
Guarini, KW
Russell, TP [1 ]
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Silvio O Conte Natl Ctr Polymer Res, Amherst, MA 01003 USA
[2] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1002/adma.200404906
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Thin films of asymmetric diblock copolymers have been used as scaffolds to define an ordered array of nanometer-scale reaction vessels in which high density arrays of silicon oxide nanostructures (see Figure) are produced by exposure to silicon tetrachloride. Such site-specific silicon oxide nanostructures could have widespread uses for sensory and optoelectronic applications.
引用
收藏
页码:702 / +
页数:6
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