Ultra-low, threshold laser ablation investigated by time-resolved microscopy

被引:18
作者
Dlott, DD [1 ]
机构
[1] Univ Illinois, Sch Chem Sci, Urbana, IL 61801 USA
关键词
laser ablation; laser photothermal imaging; time-resolved microscopy; computer-to-press imaging; titanium nitride;
D O I
10.1016/S0169-4332(02)00294-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Laser ablation materials are described that can be exposed using inexpensive near-IR lasers such as laser diodes. These materials were designed to act as printing plates in offset lithographic printing presses. Studies of the fundamental mechanisms of laser ablation were conducted using pulse-duration-dependent time-resolved optical microscopy. A knowledge of these mechanisms was used to engineer advanced ablation materials. Addition of an energetic polymer underneath the ablation layer, and the use of stress-assisted ablation were two strategies employed to achieve ultra-low ablation thresholds of a few tens of mJ/cm(2). (C) 2002 Elsevier Science B.V All rights reserved.
引用
收藏
页码:3 / 10
页数:8
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