Microstructure of duplex-phase NbSi2(C40)/MoSi2(C11b) crystals containing a single set of lamellae

被引：44

作者：

Nakano, T

Nakai, Y

Maeda, S

Umakoshi, Y

机构：

[1] Osaka Univ, Grad Sch Engn, Dept Mat Sci & Engn, Suita, Osaka 5650871, Japan

[2] Osaka Univ, Grad Sch Engn, Frontier Res Ctr, Suita, Osaka 5650871, Japan

来源：

ACTA MATERIALIA | 2002年 / 50卷 / 07期

关键词：

silicides; lamellar structure;

D O I：

10.1016/S1359-6454(02)00030-7

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Microstructures of duplex-phase C40/C11(b) silicides from combinations of NbSi2, VSi2, or TiSi2, with MoSi2, were investigated focusing on formation and alignment of lamellae. The lamellar structure was formed by zone melting and subsequent appropriate heat treatment for all combinations, but oriented lamellae were obtained only in NbSi2/MoSi2 duplex crystals. The oriented lamellar structure satisfied the crystallographic relationship of (0001)(C40)//(110)(C11b). <(1) over bar2 (1) over bar0](C40)//[1 (1) over bar0](C11b) and <10 (1) over bar0](C40)//[001](C11b), resulting information of three variants of the C11(b) phase and two kinds of boundary: a type of C11(b)/C11(b) grain boundary and a type of C11(b)/C40 phase boundary. Further annealing induced coarsening of both phases and changed the crystallographic relation due to relaxation of misfit strain at boundaries. (C) 2002 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：1781 / 1795

页数：15

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