Characteristics and high water-repellency of a-C:H films deposited by r.f. PECVD

被引：16

作者：

Kim, JD

Lee, KH

Kim, KY

Sugimura, H

Takai, O

Wu, YY

Inoue, Y

机构：

[1] Nagoya Univ, Grad Sch Engn, Nagoya, Aichi 4648603, Japan

[2] Aichi Sci & Technol Fdn, Nagoya, Aichi 4600002, Japan

[3] Nagoya Univ, Res Ctr Nucl Mat Recycle, Nagoya, Aichi, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2003年 / 162卷 / 2-3期

关键词：

a-C : H film; PECVD; water-repellency; surface groups; surface roughness;

D O I：

10.1016/S0257-8972(02)00704-1

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Hydrogenated amorphous carbon (a-C:H) films have been prepared by r.f. plasma-enhanced chemical vapor deposition at low bias voltage from 0 to -40 V with CH4 and H-2 as raw materials. The a-C:H films deposited with no bias applied showed characteristics of polymeric films with a large fluorescence level while the a-C:H films deposited at a bias voltage of r.f. 150 W showed characteristics from diamond-like carbon to graphitic nature with a significantly reduced fluorescence level. High water-repellency of over 140degrees in a contact angle obtained at a-C:H/trimetylmethoxysilane/Si structures. This high water-repellency is due to CH groups on surfaces and the roughness. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：135 / 139

页数：5

共 34 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J].