Polymer stamps for nanoimprinting

被引:31
作者
Pfeiffer, K
Fink, M
Ahrens, G
Gruetzner, G
Reuther, F [1 ]
Seekamp, J
Zankovych, S
Torres, CMS
Maximov, I
Beck, M
Graczyk, M
Montelius, L
Schulz, H
Scheer, HC
Steingrueber, F
机构
[1] Micro Resist Technol GmbH, Berlin, Germany
[2] Univ Wuppertal, Inst Mat Sci, Wuppertal, Germany
[3] Univ Wuppertal, Dept Elect & Informat Engn, Wuppertal, Germany
[4] Lund Univ, Div Solid State Phys, Lund, Sweden
[5] Lund Univ, Nanometer Struct Consortium, Lund, Sweden
[6] Univ Wuppertal, Dept Microstruct Engn, Wuppertal, Germany
[7] Heinrich Hertz Inst Nachrichtentech Berlin GmbH, Berlin, Germany
关键词
nanoimprint lithography; stamp fabrication; crosslinked polymers; e-beam resist;
D O I
10.1016/S0167-9317(02)00577-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Stamp fabrication for nanoimprinting can be significantly simplified, when specialized crosslinking polymers are applied to pattern definition. The polymer patterns can be used as stamps themselves. Two possibilities are reported: (1) An e-beam sensitive resist was developed, which enables the fabrication of polymer-on-silicon stamps. Patterns with a feature size of 70 nm could be created. (2) Full plastic stamps were obtained by a casting-moulding technique, which enable pattern transfer from any conventional mould. The quality of the two stamp variants were proved by imprinting experiments. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:393 / 398
页数:6
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