A comparison of near-field lithography and planar lens lithography

被引：3

作者：

Melville, D. O. S. ^{[1
]}

Blaikie, R. J. ^{[1
]}

Alkaisi, M. M. ^{[1
]}

机构：

[1] Univ Canterbury, Dept Elect & Comp Engn, MacDiarmid Inst Adv Mat & Nanotechnol, Christchurch 1, New Zealand

来源：

CURRENT APPLIED PHYSICS | 2006年 / 6卷 / 03期

关键词：

silver lens; superlens; perfect lens; negative refraction;

D O I：

10.1016/j.cap.2005.11.031

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The resolution of a near-field lithography technique that uses a planar silver lens to form a near-field image has been investigated and compared with hard-contact lithography. Sub-diffraction-limited imaging has been observed through a 50 nm silver film, confirming a recent superlensing proposal [J.B. Pendry, Phys. Rev. Lett. 85 (2000) 3966], with grating periods down to 170 nm pitch being patterned into resist using simple broadband UV-illumination. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：415 / 418

页数：4

共 7 条

[1] Sub-diffraction-limited patterning using evanescent near-field optical lithography
Alkaisi, MM
Blaikie, RJ
McNab, SJ
Cheung, R
Cumming, DRS
[J]. APPLIED PHYSICS LETTERS, 1999, 75 (22) : 3560 - 3562
[2] Imaging through planar silver lenses in the optical near field
Blaikie, RJ
Melville, DOS
[J]. JOURNAL OF OPTICS A-PURE AND APPLIED OPTICS, 2005, 7 (02): : S176 - S183
[3] Patterning Sub-50 nm features with near-field embedded-amplitude masks
Goodberlet, JG
Kavak, H
[J]. APPLIED PHYSICS LETTERS, 2002, 81 (07) : 1315 - 1317
[4] Contrast in the evanescent near field of λ/20 period gratings for photolithography
McNab, SJ
Blaikie, RJ
[J]. APPLIED OPTICS, 2000, 39 (01) : 20 - 25
[5] Near-field optical lithography using a planar silver lens
Melville, DOS
Blaikie, RJ
[J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (06): : 3470 - 3474
[6] Submicron imaging with a planar silver lens
Melville, DOS
Blaikie, RJ
Wolf, CR
[J]. APPLIED PHYSICS LETTERS, 2004, 84 (22) : 4403 - 4405
[7] Negative refraction makes a perfect lens
Pendry, JB
[J]. PHYSICAL REVIEW LETTERS, 2000, 85 (18) : 3966 - 3969

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