A comparison of near-field lithography and planar lens lithography

被引:3
作者
Melville, D. O. S. [1 ]
Blaikie, R. J. [1 ]
Alkaisi, M. M. [1 ]
机构
[1] Univ Canterbury, Dept Elect & Comp Engn, MacDiarmid Inst Adv Mat & Nanotechnol, Christchurch 1, New Zealand
关键词
silver lens; superlens; perfect lens; negative refraction;
D O I
10.1016/j.cap.2005.11.031
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The resolution of a near-field lithography technique that uses a planar silver lens to form a near-field image has been investigated and compared with hard-contact lithography. Sub-diffraction-limited imaging has been observed through a 50 nm silver film, confirming a recent superlensing proposal [J.B. Pendry, Phys. Rev. Lett. 85 (2000) 3966], with grating periods down to 170 nm pitch being patterned into resist using simple broadband UV-illumination. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:415 / 418
页数:4
相关论文
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