Few-Layer MoS2: A Promising Layered Semiconductor

被引:1249
作者
Ganatra, Rudren [1 ]
Zhang, Qing [1 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Nanoelect Ctr Excellence, NOVITAS, Singapore 639798, Singapore
关键词
two-dimensional materials; molybdenum disulfide; transition metal dichalcogenides; 2D; nanosheets; TRANSITION-METAL DICHALCOGENIDES; THIN-FILM TRANSISTORS; VAPOR-PHASE GROWTH; MONOLAYER MOS2; MOLYBDENUM-DISULFIDE; ELECTRONIC-STRUCTURE; HIGH-PERFORMANCE; LARGE-AREA; LITHIUM STORAGE; VALLEY POLARIZATION;
D O I
10.1021/nn405938z
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Due to the recent expanding Interest in two-dimensional layered materials, molybdenum disulfide (MoS2) has been receiving much research attention. Having an ultrathin layered structure and an appreciable direct band gap of 1.9 eV in the monolayer regime, few-layer MoS2 has good potential applications in nanoelectronics, optoelectronics, and flexible devices. In addition, the capability of controlling spin and valley degrees of freedom makes it a promising material for spintronic and valleytronic devices. In this review, we attempt to provide an overview of the research relevant to the structural and physical properties, fabrication methods, and electronic devices of few-layer MoS2. Recent developments and advances in studying the material are highlighted.
引用
收藏
页码:4074 / 4099
页数:26
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