Comparison of the growth and properties of ultrananocrystalline diamond and nanocrystalline diamond

被引:139
作者
Williams, O. A.
Daenen, M.
D'Haen, J.
Haenen, K.
Maes, J.
Moshchalkov, V. V.
Nesladek, M.
Gruen, D. M.
机构
[1] Hasselt Univ, Inst Mat Res, B-3590 Diepenbeek, Belgium
[2] IMEC, Div IMOMEC, B-3590 Diepenbeek, Belgium
[3] Katholieke Univ Leuven, Lab Solid State Phys & Magnetism, Pulsed Field Grp, B-3001 Louvain, Belgium
[4] Argonne Natl Lab, Mat Sci Div, Argonne, IL 60439 USA
关键词
nanocrystalline; chemical vapour deposition; microstructure;
D O I
10.1016/j.diamond.2005.12.009
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this paper we compare and contrast the growth and properties of ultrananocrystalline (UNCD) and nanocrystalline (NCD) diamond. These two structures, grown from hydrogen poor and hydrogen rich plasmas, respectively, have markedly different structural properties. We characterise the plasmas used for growth with in situ optical emission spectroscopy and dual wavelength pyrometry. The films are characterised with scanning electron microscopy in both plan view and cross section. Raman spectroscopy was used to investigate bonding. Finally we make a clear definition of these two different microstructures. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:654 / 658
页数:5
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