Plasma characteristics observed through high-aspect-ratio holes in C4F8 plasma

被引：29

作者：

Kurihara, K

Sekine, M

机构：

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 1996年 / 5卷 / 02期

关键词：

ION-BOMBARDMENT; RF ELECTRODE; ENERGY; POTENTIALS; FIELD;

D O I：

10.1088/0963-0252/5/2/002

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Ion species and their energy distributions impinging on a powdered electrode are investigated through high-aspect-ratio holes in the C4F8 plasma of a magnetron etcher. A decrease in ion current and a change in ion energy distribution depending on the aspect ratio of holes were observed. The effects of inclined ion trajectory and charging at the side wall were examined theoretically and experimentally. It was found that the charging and a deposit on the side wall of holes greatly influenced the ions passing through holes.

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页码：121 / 125

页数：5

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