Phase separation in InGaN multiple quantum wells annealed at high nitrogen pressures

被引:41
作者
Romano, LT
McCluskey, MD
Van de Walle, CG
Northrup, JE
Bour, DP
Kneissl, M
Suski, T
Jun, J
机构
[1] Xerox Corp, Palo Alto Res Ctr, Palo Alto, CA 94304 USA
[2] UI, Unipress, PL-01142 Warsaw, Poland
关键词
D O I
10.1063/1.125504
中图分类号
O59 [应用物理学];
学科分类号
摘要
Phase separation was found to occur in In0.33Ga0.67N/GaN multiple-quantum-well structures after annealing at 975 degrees C in a hydrostatic pressure of 5 kbar N-2 for 4 h. X-ray diffraction (XRD) spectra of the as-grown samples showed superlattice peaks that were replaced by a broad, single-phase peak after annealing. Transmission electron microscopy (TEM) images of the annealed samples show In-rich precipitates and voids that are found only within the quantum-well region. Both TEM and XRD measurements indicated that the formation of voids and second phases were suppressed after annealing in a hydrostatic pressure of 15 kbar. In addition, optical absorption measurements on these samples showed no indication of a peak at 2.65 eV that was observed in previous annealing studies. (C) 1999 American Institute of Physics. [S0003-6951(99)02351-7].
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页码:3950 / 3952
页数:3
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