Double-barrier Josephson structures as the novel elements for superconducting large-scale integrated circuits

被引:73
作者
Kupriyanov, MY
Brinkman, A
Golubov, AA
Siegel, M
Rogalla, H
机构
[1] Univ Twente, Dept Appl Phys, NL-7500 AE Enschede, Netherlands
[2] Moscow MV Lomonosov State Univ, Inst Nucl Phys, Moscow 119899, Russia
[3] KFA Julich, Inst Thin Films & Ion Technol, D-42425 Julich, Germany
来源
PHYSICA C-SUPERCONDUCTIVITY AND ITS APPLICATIONS | 1999年 / 326-27卷
关键词
double-barrier; Josephson structures; integrated circuits;
D O I
10.1016/S0921-4534(99)00408-6
中图分类号
O59 [应用物理学];
学科分类号
摘要
An overview of the current status of different types of non-hysteretic Josephson junctions is given with emphasis on double-barrier structures. The results of theoretical work on double-barrier SIS'IS Josephson junctions (I is a tunnel barrier, S' is a thin film with T-C' < T-C) are presented. The microscopic model for the supercurrent is developed for two cases: the S' interlayer in the clean and in the dirty Limit. The model describes the cross-over from direct Josephson coupling of the external S electrodes to the regime of two serially connected SIS' junctions. We calculate the ICRN product as a function of the T-C'/T-C ratio, the interlayer thickness and the barrier strengths and compare the theory with experimental data for Nb/AlOx/Al/AlOx/Nb junctions. We argue that these junctions are very promising in rapid single flux quantum (RSFQ) and programmable voltage standard applications, since they are intrinsically shunted and have controllable interfaces. We formulate the requirements for materials and interface barriers in order to increase critical current densities and ICRN products in double-barrier junctions. (C) 1999 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:16 / 45
页数:30
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