Preparation of zinc oxide thin films by pulsed current electrolysis

被引：20

作者：

Nomura, K ^{[1
]}

Shibata, N

Maeda, M

机构：

[1] Nagoya Inst Technol, Dept Appl Chem, Showa Ku, Nagoya, Aichi 4668555, Japan

[2] Japan Fine Ceram Ctr, Atsuta Ku, Nagoya, Aichi 4568587, Japan

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 2002年 / 149卷 / 07期

关键词：

D O I：

10.1149/1.1483868

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

ZnO thin films were prepared on indium-tin oxide (ITO) substrates by pulsed current electrolysis. The preferred orientation of the ZnO thin films prepared by pulsed current electrolysis changed in order to (0002), (10 (1) over bar1), and (1010) by the change in overvoltage. Green-yellow emission centered around 580 nm was observed for the ZnO films. The increase of intensity of the green-yellow emission may be ascribed to effects brought about during the pause of electrolysis. The transmittance at 600 nm for ZnO thin films prepared by pulsed current electrolysis was over 95%. It was demonstrated that pulsed current electrolysis is effective for control of preferred orientation and concentration of lattice defects and for improvement of the transmittance of ZnO thin films. (C) 2002 The Electrochemical Society.

引用

页码：F76 / F80

页数：5

共 21 条

[1] THE EFFECTS OF DEPOSITION VARIABLES ON THE SPRAY-PYROLYSIS OF ZNO THIN-FILM [J].

AMBIA, MG ;

ISLAM, MN ;

HAKIM, MO .

JOURNAL OF MATERIALS SCIENCE, 1994, 29 (24) :6575-6580

[2] LUMINESCENCE OF HETEROEPITAXIAL ZINC-OXIDE [J].

BETHKE, S ;

PAN, H ;

WESSELS, BW .

APPLIED PHYSICS LETTERS, 1988, 52 (02) :138-140

[3] Growth of ZnO single crystal thin films on c-plane (0 0 0 1) sapphire by plasma enhanced molecular beam epitaxy [J].

Chen, YF ;

Bagnall, DM ;

Zhu, ZQ ;

Sekiuchi, T ;

Park, KT ;

Hiraga, K ;

Yao, T ;

Koyama, S ;

Shen, MY ;

Goto, T .

JOURNAL OF CRYSTAL GROWTH, 1997, 181 (1-2) :165-169

[4] Photoluminescence and ultraviolet lasing of polycrystalline ZnO thin films prepared by the oxidation of the metallic Zn [J].

Cho, SL ;

Ma, J ;

Kim, YK ;

Sun, Y ;

Wong, GKL ;

Ketterson, JB .

APPLIED PHYSICS LETTERS, 1999, 75 (18) :2761-2763

[5] PULSE PLATING [J].

DEVARAJ, G ;

GURUVIAH, S ;

SESHADRI, SK .

MATERIALS CHEMISTRY AND PHYSICS, 1990, 25 (05) :439-461

[6] Electrochemical deposition of zinc oxide films from non-aqueous solution: a new buffer/window process for thin film solar cells [J].

Gal, D ;

Hodes, G ;

Lincot, D ;

Schock, HW .

THIN SOLID FILMS, 2000, 361 :79-83

[7]

*INT CTR DIFFR DAT, 361451 INT CTR DIFFR

[8] Characterization of transparent zinc oxide films prepared by electrochemical reaction [J].

Izaki, M ;

Omi, T .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1997, 144 (06) :1949-1952

[9]

Izaki M, 1996, APPL PHYS LETT, V68, P2439, DOI 10.1063/1.116160

[10]

LAM TL, 1983, METAL SURF TECHNOL, V34, P428

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