Controlling Atomic Layer Deposition of TiO2 in Aerogels through Surface Functionalization

被引：25

作者：

Ghosal, Sutapa ^{[1
]}

Baumann, Theodore F. ^{[1
]}

King, Jeffrey S. ^{[2
]}

Kucheyev, Sergei O. ^{[1
]}

Wang, Yinmin ^{[1
]}

Worsley, Marcus A. ^{[1
]}

Biener, Juergen ^{[1
]}

Bent, Stacey F. ^{[2
]}

Hamza, Alex V. ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab, Nanoscale Synth & Characterizat Lab, Livermore, CA 94550 USA

[2] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA

来源：

CHEMISTRY OF MATERIALS | 2009年 / 21卷 / 09期

关键词：

TITANIUM-OXIDE; METAL; GROWTH; RESIST; FILMS;

D O I：

10.1021/cm900636s

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This report demonstrates a chemical functionalization method for controlling TiO2 ALD in low-density nanoporous materials, i.e., aerogels. Functionalization of silica aerogel with trimethylsilane is shown to inhibit TiO2 growth on the aerogel via ALD. A proposed mechanism for the deactivation effect is the blocking of surface functional groups, such as hydroxyl (OH) moieties, which serve as chemisorption sites for the ALD precursors and hence are essential for nucleating the deposition process. Subsequent modification of the aerogel functionalization through the selective removal of hydrocarbon groups via heat or plasma treatment reactivates the aerogel towards deposition, thereby resulting in TiO2 growth. The results presented here demonstrate the use of ALD as a selective tool for creating novel nanoporous materials.

引用

页码：1989 / 1992

页数：4

共 33 条

[1] Atomic layer deposition of titanium dioxide from TiCl4 and H2O:: investigation of growth mechanism [J].

Aarik, J ;

Aidla, A ;

Mändar, H ;

Uustare, T .

APPLIED SURFACE SCIENCE, 2001, 172 (1-2) :148-158

[2]

Barbe CJ, 1997, J AM CERAM SOC, V80, P3157, DOI 10.1111/j.1151-2916.1997.tb03245.x

[3] Atomic layer deposition of uniform metal coatings on highly porous aerogel substrates [J].

Baumann, Theodore F. ;

Biener, Juergen ;

Wang, Yinmin M. ;

Kucheyev, Sergei O. ;

Nelson, Erik J. ;

Satcher, Joe H., Jr. ;

Elam, Jeffrey W. ;

Pellin, Michael J. ;

Hamza, Alex V. .

CHEMISTRY OF MATERIALS, 2006, 18 (26) :6106-6108

[4] KINETIC STUDIES IN THE CHEMISTRY OF RUBBER AND RELATED MATERIALS .1. THE THERMAL OXIDATION OF ETHYL LINOLEATE [J].

BOLLAND, JL .

PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1946, 186 (1005) :218-236

[5] Surface-enhanced Raman scattering of small molecules from silver-coated silicon nanopores [J].

Chan, S ;

Kwon, S ;

Koo, TW ;

Lee, LP ;

Berlin, AA .

ADVANCED MATERIALS, 2003, 15 (19) :1595-+

[6] Achieving area-selective atomic layer deposition on patterned substrates by selective surface modification [J].

Chen, R ;

Kim, H ;

McIntyre, PC ;

Porter, DW ;

Bent, SF .

APPLIED PHYSICS LETTERS, 2005, 86 (19) :1-3

[7] Self-assembled monolayer resist for atomic layer deposition of HfO2 and ZrO2 high-κ gate dielectrics [J].

Chen, R ;

Kim, H ;

McIntyre, PC ;

Bent, SF .

APPLIED PHYSICS LETTERS, 2004, 84 (20) :4017-4019

[8] Pharmacological profile of a novel, non-TZD PPARγ agonist [J].

Chen, X ;

Osborne, MC ;

Rybczynski, PJ ;

Zeck, R ;

Yang, M ;

Xu, J ;

Zhou, L ;

Cryan, E ;

Tang, Y ;

Demarest, KT .

DIABETES OBESITY & METABOLISM, 2005, 7 (05) :536-546

[9] Ordered porous materials for emerging applications [J].

Davis, ME .

NATURE, 2002, 417 (6891) :813-821

[10] ALGORITHMS FOR THE RAPID SIMULATION OF RUTHERFORD BACKSCATTERING SPECTRA [J].

DOOLITTLE, LR .

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1985, 9 (03) :344-351

← 1 2 3 4 →