Atomic layer deposition of uniform metal coatings on highly porous aerogel substrates

被引:39
作者
Baumann, Theodore F. [1 ]
Biener, Juergen
Wang, Yinmin M.
Kucheyev, Sergei O.
Nelson, Erik J.
Satcher, Joe H., Jr.
Elam, Jeffrey W.
Pellin, Michael J.
Hamza, Alex V.
机构
[1] Lawrence Livermore Natl Lab, Chem & Mat Sci Directorate, Livermore, CA 94551 USA
[2] Argonne Natl Lab, Div Energy Syst, Argonne, IL 60439 USA
关键词
D O I
10.1021/cm061752g
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
A new templating method that utilizes atomic layer deposition (ALD) process to deposit conformal metal films inside high aspect ratio structures, for the fabrication of porous metal nanostructures, is introduced. Aerogels are a special class of of low-density, open-cell foams with submicrometer architectures, and are ideal templates for the preparation of nanocellular metal foams. This method has been successfully employed for the preparation and characterization of tungsten (W)-coated alumina and germania aerogels. Microstructural analysis of these materials showed that tungsten deposition was uniform throughout each template. It is also observed that the morphology of the deposited metal depends on the surface chemistry of the skeletal aerogel network. The porosity and density of the metal foam, resulting from this approach, can be reliably controlled through the selection of aerogels template and the number of metal deposition cycles.
引用
收藏
页码:6106 / 6108
页数:3
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