Metal-based single electron transistors

被引:27
作者
Chen, W
Ahmed, H
机构
[1] Cavendish Laboratory, University of Cambridge, Cambridge
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 04期
关键词
D O I
10.1116/1.589548
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metal-based single electron transistors operating at liquid nitrogen temperature were fabricated. Multiple tunnel junctions with metal particles of about 3 nm in diameter were used to construct the transistors. In these transistors the gates are placed directly underneath the islands and separated only by a 10-nm-thick dielectric. The capacitance of the islands is less than 1 aF. Clear oscillations induced by gate bias voltage are observed in the current-voltage characteristics at 77 K. (C) 1997 American Vacuum Society.
引用
收藏
页码:1402 / 1405
页数:4
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