Optical properties of titania films prepared by off-plane filtered cathodic vacuum arc

被引：31

作者：

Zhao, ZW ^{[1
]}

Tay, BK ^{[1
]}

Lau, SP ^{[1
]}

Yu, GQ ^{[1
]}

机构：

[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore

来源：

JOURNAL OF CRYSTAL GROWTH | 2004年 / 268卷 / 3-4期

关键词：

physical vapor deposition processes; oxides; dielectric materials;

D O I：

10.1016/j.jcrysgro.2004.04.088

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

Amorphous titania thin films were deposited by an off-plane filtered cathodic vacuum arc (FCVA) at a process pressure of 3.0 x 10(-4) Torr at room temperature. Core level of Ti 2p(3/2) (458.3 eV) and O 1 s (529.9 eV) obtained from XPS spectrum and their deviation in binding energy (DeltaBE = 71.6 eV) indicate that only the Ti4+ of Ti oxidation state exists in the film and the film was of ideal stoichiometry. The film exhibits good optical properties, such as high transmittance and optical band gap. Moreover, it possesses bulk-like refractive index (up to 2.57 at 550 nm) and lower extinction coefficient (similar to10(-4) at 550 nm) with smooth surface. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：543 / 546

页数：4

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