A capacitorless double-gate DRAM cell

被引:64
作者
Kuo, C [1 ]
King, TJ [1 ]
Hu, CM [1 ]
机构
[1] Univ Calif Berkeley, Dept Elect Engn & Comp Sci, Berkeley, CA 94720 USA
关键词
double-gate MOSFETs; fully depleted; silicon-on-insulator (SOI) MOSFETs; scaled CMOS; DRAM;
D O I
10.1109/LED.2002.1004230
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A capacitorless double-gate DRAM (DG-DRAM) cell is proposed in this study. Its dual gates and thin body reduce off-state leakage and disturb problems. Dopant fluctuations, which can be particularly important in high-density arrays, are avoided by using a thin, lightly doped body. The cell's large body coefficient ((dV(T))/(dV(BS))) transforms small gains of body potential into increased drain current. MEDICI simulations for 85degreesC show that a DG-DRAM cell may sustain a measurable change in drain current several hundred milliseconds after programming. These characteristics suggest that a thin body, double-gate cell is an interesting candidate for high density DRAM technologies.
引用
收藏
页码:345 / 347
页数:3
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