Cadmium-free buffer layers deposited by atomic later epitaxy for copper indium diselenide solar cells

被引:90
作者
Yousfi, EB
Asikainen, T
Pietu, V
Cowache, P
Powalla, M
Lincot, D
机构
[1] Ecole Natl Super Chim Paris, UMR 7575, Lab Electrochim & Chim Analyt, F-75231 Paris, France
[2] Microchem Ltd, FIN-02631 Espoo, Finland
[3] Zentrum Solarenergie & Wasserstofforsch, D-70565 Stuttgart, Germany
关键词
copper indium diselenide; atomic layer epitaxy; indium sulfide; solar cell; zinc oxysulfide;
D O I
10.1016/S0040-6090(99)00860-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
As a soft and highly controllable deposition technique, atomic layer epitaxy (ALE) is well suited to deposit buffer and window layers on CIS thin solar films with high interface quality. In this work we have investigated ALE buffer layers of zinc oxysulfide, indium sulfide and aluminum oxide deposited at low temperature (160 degrees C). The most promising results have been obtained with using indium sulfide buffer layers, with a record efficiency of 13.5% (30.6 mA /cm(2), 604 mV, FF = 0.73 under 100 mW /cm(2), without AR coating) achieved on a standard CIGS absorber. This opens a route for a dry cadmium-free buffer process fully compatible with the other vacuum deposition techniques (coevaporation, sputtering). (C) 2000 Elsevier Science S.A. All rights reserved.
引用
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页码:183 / 186
页数:4
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