Modulated sputtering process for smooth surface YBCO film deposition

被引：4

作者：

Camerlingo, C

Ruggiero, B

Russo, M

Sarnelli, E

DelVecchio, A

DeRiccardis, F

Tapfer, L

机构：

[1] CNRSM, PASTIS, I-72100 BRINDISI, ITALY

[2] UNIV LECCE, DIPARTIMENTO SCI MAT, I-73100 LECCE, ITALY

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 1997年 / 251卷 / 1-2期

关键词：

modulated sputtering process; YBCO film deposition; REACTIVE COEVAPORATION; THIN-FILMS; GROWTH; ULTRATHIN;

D O I：

10.1016/S0925-8388(96)02766-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A method to fabricate high T-c superconducting films exhibiting a small surface roughness has been developed, using conventional de inverted cylindrical magnetron sputtering. The method is based on the periodic modulation of the sputtering power during the deposition process; accordingly, deposition rate periodically reaches values as low as the 25% of the full power value. YBCO films, fabricated following such a modulated deposition process, have been electrically characterized and structurally investigated by X-ray diffractometry. The surface morphology has been analyzed by atomic force and scanning electron microscopy. Surface roughness as low as 2 nm have been obtained by using a modulation period of 30 s.

引用

页码：34 / 36

页数：3

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