MARS: Femtosecond laser mask advanced repair system in manufacturing

被引：28

作者：

Haight, R ^{[1
]}

Hayden, D

Longo, P

Neary, T

Wagner, A

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA

[2] IBM Corp, Microelect Div, Essex Jct, VT 05452 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590968

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Presently available nanosecond laser based tools for removing Cr defects from photomasks have proven inadequate to the task due to the thermal nature of the ablation process which produces metal splatter, haze, reduced transmission, and pitting of the quartz substrate. These problems are virtually nonexistent when employing femtosecond pulses of light to ablate Cr defects in a nonthermal process. Photomasks repaired with ultrashort light pulses exhibit transmission approaching 100%, no observable glass damage, and exceptional spatial resolution. We have built a femtosecond pulsed laser mask repair system which is presently operating successfully in a manufacturing environment. (C) 1999 American Vacuum Society. [S0734-211X(99)16206-1].

引用

页码：3137 / 3143

页数：7

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