The effect of annealing temperature on the statistical properties of WO3 surface

被引：31

作者：

Jafari, G. R. ^{[1
]}

Saberi, A. A.

Azimirad, R.

Moshfegh, A. Z.

Rouhani, S.

机构：

[1] Shahid Beheshti Univ, Dept Phys, Tehran 19839, Iran

[2] IPM, Dept Nanosci, Tehran, Iran

[3] Sharif Univ Technol, Dept Phys, Tehran, Iran

来源：

JOURNAL OF STATISTICAL MECHANICS-THEORY AND EXPERIMENT | 2006年

关键词：

thin film deposition (theory); thin film deposition (experiment); stochastic processes (theory); stochastic processes (experiment);

D O I：

10.1088/1742-5468/2006/09/P09017

中图分类号：

O3 [力学];

学科分类号：

08 ; 0801 ;

摘要：

We have studied the effect of annealing temperature on the statistical properties of WO3 surface using atomic force microscopy (AFM) techniques. We have applied both level crossing and structure function methods. Level crossing analysis indicates an optimum annealing temperature of around 400 degrees C at which the effective area of the WO3 thin film is maximum, whereas the composition of the surface remains stoichiometric. The complexity of the height fluctuation of surfaces was characterized by roughness, the roughness exponent and the lateral size of surface features. We have found that there is a phase transition at around 400 degrees C from one set to two sets of roughness parameters. This happens due to microstructural changes from amorphous to crystalline structure in the samples, which have already been found experimentally.

引用

页数：14

共 37 条

[1] Phase transformations inWO3 thin films during annealing [J].