Pentacene field-effect transistors with sub-10-nm channel lengths

被引:65
作者
Wang, L [1 ]
Fine, D
Jung, TH
Basu, D
von Seggern, H
Dodabalapur, A
机构
[1] Univ Texas, Ctr Microelect Res, Austin, TX 78758 USA
[2] Tech Univ Darmstadt, Inst Sci Mat, D-64287 Darmstadt, Germany
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.1790033
中图分类号
O59 [应用物理学];
学科分类号
摘要
The field effect in pentacene thin-film transistors was studied using bottom-contact devices with channel lengths below 10 nm. To suppress spreading current in these devices, which have a small channel width-to-length (W-L) ratio, we employed a pair of guarding electrodes as close as 20 nm to the two sides of the channel. The responses of these nanometer scale transistors exhibit good gate modulation. Mobilities of 0.046 cm(2)/Vs and on/off ratios of 97 were achieved in sub-10-nm transistors. We find that the device response is strongly influenced by the nature of the metal-semiconductor contact. (C) 2004 American Institute of Physics.
引用
收藏
页码:1772 / 1774
页数:3
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