Topographical artifacts and optical resolution in near-field optical microscopy

被引:44
作者
Bozhevolnyi, SI
机构
[1] Institute of Physics, Aalborg University, Pontoppidanstrœde 103
关键词
D O I
10.1364/JOSAB.14.002254
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Starting from general principles of near-field optical microscopy, I demonstrate that an optical image obtained with any near-field microscope operating in a constant (probe-surface) distance mode contains pure topographical artifacts, topographically induced features, and pure optical contrast. Scanning a sharp topographical step at an otherwise homogeneous sample surface is shown to provide a sensitivity window that determines the scale on which the near-field optical image would represent mostly pure optical contrast. I suggest that the sensitivity window can be regarded as the upper limit of optical resolution of a near-field microscope. (C) 1997 Optical Society of America.
引用
收藏
页码:2254 / 2259
页数:6
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