Formation of silicon nanoparticles and web-like aggregates by femtosecond laser ablation in a background gas

被引:63
作者
Tull, B. R.
Carey, J. E.
Sheehy, M. A.
Friend, C.
Mazur, E.
机构
[1] Harvard Univ, Div Engn & Appl Sci, Cambridge, MA 02138 USA
[2] Harvard Univ, Dept Chem & Biol Chem, Cambridge, MA 02138 USA
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2006年 / 83卷 / 03期
关键词
D O I
10.1007/s00339-006-3502-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We show that the mechanism of nanoparticle formation during femtosecond laser ablation of silicon is affected by the presence of a background gas. Femtosecond laser ablation of silicon in a H-2 or H2S background gas yields a mixture of crystalline and amorphous nanoparticles. The crystalline nanoparticles form via a thermal mechanism of nucleation and growth. The amorphous material has smaller features and forms at a higher cooling rate than the crystalline nanoparticles. The background gas also results in the suspension of plume material in the gas for extended periods, resulting in the formation (on a thin film carbon substrate) of unusual aggregated structures including nanoscale webs that span tears in the film. The presence of a background gas provides additional control of the structure and composition of the nanoparticles during short pulse laser ablation.
引用
收藏
页码:341 / 346
页数:6
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