Cohesive failure of the Cu/polyimide system

被引:23
作者
Park, IS
Ahn, EC
Yu, J
Lee, HY
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Yusong Gu, Taejon 305701, South Korea
[2] Res Ctr, Hungduk Gu, Cheongju City 360480, Chungbuk, South Korea
[3] Samsung Elect Co Ltd, Packaging Technol Team, Mfg Technol Ctr, Asan City 336850, Chungnam, South Korea
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2000年 / 282卷 / 1-2期
关键词
cohesive failure; metal/polymer interface; CuCr alloy; depth profiling;
D O I
10.1016/S0921-5093(99)00763-7
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The cohesive failure which occurs in the inside of the polymer near the metal/polymer interface was studied in the Cu:Cr/polyimide and Cu/CuCr/polyimide systems. The interface energy was varied by pretreating the polyimide surface by varying rf plasma power density, or by varying the Cr content in the CuCr alloy layer, respectively, and peel tests were conducted. Then, peeled metal strips were analyzed by AES and XPS, and correlations were made among the peel strength, the amount of carbide-like Cr-C bonds near the interface, and the polyimide thickness on peeled metal films inferred from the AES depth profiling. Results indicate that the peel strength increased with the rf power density at a constant metal thickness and that the thickness of polyimide adhering to peeled metal films increased with the peel strength, which was related to the amount of carbide-like Cr-C bond near the interface affecting the interface energy. In the case of specimens with the same plasma treatment but various metal layer thickness, the thickness of polyimide on peeled metal films remained constant even though the peel strength increased with the metal layer thickness. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:137 / 144
页数:8
相关论文
共 19 条
  • [1] Adhesion behavior of CuCr alloy/polyimide films under 350 degrees C and 85 degrees C/85% RH environments
    Ahn, EC
    Yu, J
    Park, IS
    Lee, WJ
    [J]. JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1996, 10 (12) : 1343 - 1357
  • [2] Ahn EC, 1996, J MATER SCI-MATER EL, V7, P175, DOI 10.1007/BF00133111
  • [3] ION-BOMBARDMENT AND TITANIUM FILM GROWTH ON POLYIMIDE
    BODO, P
    SUNDGREN, JE
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (04): : 2396 - 2402
  • [4] INTERFACIAL REACTIONS AT COPPER SURFACES COATED WITH POLYMER-FILMS
    BURRELL, MC
    CODELLA, PJ
    FONTANA, JA
    CHERA, JJ
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03): : 1778 - 1783
  • [5] PREPARATION OF LOW RESISTIVITY CU-1 AT PERCENT CR THIN-FILMS BY MAGNETRON SPUTTERING
    CABRAL, C
    HARPER, JME
    HOLLOWAY, K
    SMITH, DA
    SCHAD, RG
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1992, 10 (04): : 1706 - 1712
  • [6] ADHESION DURABILITY OF TANTALUM BPDA-PDA POLYIMIDE INTERFACES
    CALLEGARI, AC
    CLEARFIELD, HM
    FURMAN, BK
    GRAHAM, TG
    NEUGROSCHL, D
    PURUSHOTHAMAN, S
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (01): : 185 - 191
  • [7] ADHESION STUDIES OF CU-CR ALLOYS ON AL2O3
    CHAN, CJ
    CHANG, CA
    FARRELL, CE
    SCHROTT, AG
    [J]. APPLIED PHYSICS LETTERS, 1993, 62 (06) : 654 - 656
  • [8] AN AUGER STUDY ON THE INTERACTION OF CU AND CR FILMS WITH POLYIMIDE
    CHUNG, TG
    KIM, YH
    YU, J
    [J]. JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1994, 8 (01) : 41 - 51
  • [9] A STUDY OF MODIFIED POLYIMIDE SURFACES AS RELATED TO ADHESION
    FLITSCH, R
    SHIH, DY
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 2376 - 2381
  • [10] SYNCHROTRON-RADIATION EXCITED CARBON 1S PHOTOEMISSION-STUDY OF CR-ORGANIC POLYMER INTERFACES
    JORDAN, JL
    SANDA, PN
    MORAR, JF
    KOVAC, CA
    HIMPSEL, FJ
    POLLAK, RA
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1986, 4 (03): : 1046 - 1048