Model for crystallization kinetics:: Deviations from Kolmogorov-Johnson-Mehl-Avrami kinetics

被引:44
作者
Castro, M [1 ]
Domínguez-Adame, F
Sánchez, A
Rodríguez, T
机构
[1] Univ Complutense, Dept Fis Mat, GISC, E-28040 Madrid, Spain
[2] Univ Pontificia de Comillas, E-28015 Madrid, Spain
[3] Univ Carlos III Madrid, Dept Matemat, GISC, E-28911 Madrid, Spain
[4] Univ Politecn Madrid, ETSI Telecomun, Dept Tecnol Elect, E-28040 Madrid, Spain
关键词
D O I
10.1063/1.124965
中图分类号
O59 [应用物理学];
学科分类号
摘要
We propose a simple and versatile model to understand the deviations from the well-known Kolmogorov-Johnson-Mehl-Avrami kinetics theory found in metal recrystallization and amorphous semiconductor crystallization. We analyze the kinetics of the transformation and the grain-size distribution of the product material, finding a good overall agreement between our model and available experimental data. The information so obtained could help to relate the mentioned experimental deviations due to preexisting anisotropy along some regions, to a certain degree of crystallinity of the amorphous phases during deposition, or more generally, to impurities or roughness of the substrate. (C) 1999 American Institute of Physics. [S0003-6951(99)02641-8].
引用
收藏
页码:2205 / 2207
页数:3
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