The Influence of Channel Compositions on the Electrical Properties of Solution-Processed Indium-Zinc Oxide Thin-Film Transistors

被引:16
作者
Chen, Chang-Ken [1 ]
Hsieh, Hsing-Hung [1 ]
Shyue, Jing-Jong [2 ]
Wu, Chung-Chih [1 ,3 ]
机构
[1] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
[2] Acad Sinica, Res Ctr Appl Sceiences, Taipei 115, Taiwan
[3] Natl Taiwan Univ, Dept Elect Engn, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan
来源
JOURNAL OF DISPLAY TECHNOLOGY | 2009年 / 5卷 / 12期
关键词
Channel compositions; indium-zinc oxide (IZO); oxide semiconductors; solution processing; thin-film transistors (TFTs); CARRIER TRANSPORT; TRANSPARENT; SEMICONDUCTORS; FABRICATION;
D O I
10.1109/JDT.2009.2024437
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Electrical properties of indium-zinc oxide (IZO) thin-film-transistors (TFTs) based on solution processes with various channel compositions are investigated in this paper. Amorphous IZO thin films with high transparency and smooth/uniform surfaces are deposited by spin-coating. The In:Zn ratio is varied by adjusting the precursor compositions, and its influences on the electrical properties, such as resistivity, mobility, and threshold voltage, etc., of IZO films and TFTs are studied. The devices showed field effect mobility ranging from 0.07 to 2.13 cm(2)/V . s with the In component (In/(In + Zn)) varying from 0.2 to 0.5.
引用
收藏
页码:509 / 514
页数:6
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