How does a multiwalled carbon nanotube atomic force microscopy probe affect the determination of surface roughness statistics?

被引:18
作者
Hudspeth, QM
Nagle, KP
Zhao, YP
Karabacak, T
Nguyen, CV
Meyyappan, M
Wang, GC
Lu, TM
机构
[1] Rensselaer Polytech Inst, Dept Phys Appl Phys & Astron, Troy, NY 12180 USA
[2] Middlebury Coll, Dept Phys, Middlebury, VT 05753 USA
[3] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA
[4] ELORET Corp, Sunnyvale, CA 94087 USA
基金
美国国家航空航天局;
关键词
carbon; atomic force microscopy; surface roughening; dendritic and/or fractile surfaces;
D O I
10.1016/S0039-6028(02)01955-6
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Through statistical analysis of atomic force micrographs of sputtered-silicon films, we examine the determination of surface roughness parameters, and how this determination is affected by probe characteristics, such as sharpness and aspect ratio. We compare values for the roughness exponent, alpha, and the lateral correlation length, xi, calculated from micrographs obtained with multiple standard atomic force microscopy (AFM) probes in contact and noncontact modes, as well as from micrographs obtained with a multiwalled-nanotube-enhanced AFM probe. The sharper, lower-aspect-ratio nanotube probe is expected to provide a truer picture of the roughness parameters for these films. Using the nanotube probe, we obtained alpha = 0.61 +/- 0.02, as compared to alpha similar to 0.83 obtained with conventional probes. We have also found the nanotube probe is able to detect a smaller lateral correlation length compared to that of the conventional AFM probes. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:453 / 461
页数:9
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