Electrical resistivity and photoluminescence spectrum of layered oxysulfide (LaO)CuS

被引:65
作者
Takase, K
Koyano, M
Shimizu, T
Makihara, K
Takahashi, Y
Takano, Y
Sekizawa, K
机构
[1] Nihon Univ, Coll Sci & Technol, Dept Phys, Chiyoda Ku, Tokyo 1018301, Japan
[2] Japan Adv Inst Sci & Technol, Tatsunokuchi, Ishikawa 9231292, Japan
关键词
layered oxysulfide; wide gap rho-type semiconductor; electrical resistivity; photoluminescence spectrum;
D O I
10.1016/S0038-1098(02)00381-2
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
On growth conditions the dependence of the electrical resistivity and the photoluminescence (PL) spectrum of a layered oxysulfide (LaO)CuS have been investigated. The electrical resistivity shows semiconducting behavior and its magnitude decreases with the increase in the sintering temperature and time. which is considered to introduce structural defects such as Cu or La vacancies. The PL spectrum consists of six emission bands which are assigned to a direct interband transition and the transitions originating in two kinds of donor and acceptor levels corresponding to defect centers in the band gap. The PL spectra depend on the growth conditions. The introduction of lattice imperfection increases the intensity of the wide emission bands. and the (LaO)CuS sample visually appears to be 'white' under UV excitation. The white luminescence is an important property for the application to display back-light. (C) 2002 Published by Elsevier Science Ltd.
引用
收藏
页码:531 / 534
页数:4
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