Temperature behavior of multiple tunnel junction devices based on disordered dot arrays

被引:46
作者
Cordan, AS
Leroy, Y
Goltzené, A
Pépin, A
Vieu, C
Mejias, M
Launois, H
机构
[1] ENSPS, ERM PHASE, F-67400 Illkirch Graffenstaden, France
[2] CNRS, F-92225 Bagneux, France
关键词
D O I
10.1063/1.371867
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanometer-sized multijunction arrays are expected to exhibit a large Coulomb blockade effect. However, up to now, only highly disordered arrays can be fabricated. In this article, we evaluate the consequences of disorder on the dispersion of the device characteristics. We show that, as observed for regular arrays, the threshold voltage V-th increases with the length of the multijunction array. At very low temperature, the V-th dispersion is small. Conversely, at higher temperature, a large dispersion in V-th is observed. We evidence the importance of the different array parameters with respect to the device characteristics. We show that the crucial parameters are the tunnel resistances and, therefore, for a two-dimensional array, the total resistance of the minimal resistance path is the most relevant parameter. (C) 2000 American Institute of Physics. [S0021- 8979(00)05701-7].
引用
收藏
页码:345 / 352
页数:8
相关论文
共 20 条
  • [1] ABELES B, 1975, ADV PHYS, V24, P407, DOI 10.1080/00018737500101431
  • [2] AVERIN DV, 1991, MESOSCOPIC PHENOMENA, P208
  • [3] BAKHVALOV NS, 1989, ZH EKSP TEOR FIZ, V68, P581
  • [4] Self-assembled chains of graphitized carbon nanoparticles
    Bezryadin, A
    Westervelt, RM
    Tinkham, M
    [J]. APPLIED PHYSICS LETTERS, 1999, 74 (18) : 2699 - 2701
  • [5] COULOMB-BLOCKADE AT 77 K IN NANOSCALE METALLIC ISLANDS IN A LATERAL NANOSTRUCTURE
    CHEN, W
    AHMED, H
    NAKAZOTO, K
    [J]. APPLIED PHYSICS LETTERS, 1995, 66 (24) : 3383 - 3384
  • [6] Fabrication and room-temperature characterization of a silicon self-assembled quantum-dot transistor
    Choi, BH
    Hwang, SW
    Kim, IG
    Shin, HC
    Kim, Y
    Kim, EK
    [J]. APPLIED PHYSICS LETTERS, 1998, 73 (21) : 3129 - 3131
  • [7] Electron transport in metallic dot arrays: Effect of a broad dispersion in the tunnel junction dimensions
    Cordan, AS
    Goltzene, A
    Herve, Y
    Mejias, M
    Vieu, C
    Launois, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) : 3756 - 3763
  • [8] SINGLE-ELECTRON EFFECTS IN ARRAYS OF NORMAL TUNNEL-JUNCTIONS
    GEIGENMULLER, U
    SCHON, G
    [J]. EUROPHYSICS LETTERS, 1989, 10 (08): : 765 - 770
  • [9] ELECTRICAL CONDUCTION IN ULTRA THIN METAL FILMS .I. THEORETICAL
    HILL, RM
    [J]. PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1969, 309 (1498): : 377 - &
  • [10] Retention time in multiple-tunnel junction memory device
    Jalil, MBA
    Wagner, M
    Ahmed, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1999, 85 (02) : 1203 - 1210