In situ mass changes and stress measurements in Cu/Fe20Ni80 electrodeposited multilayers

被引：16

作者：

Chassaing, E

机构：

[1] Ctr. d'Etud. de Chim. Metallurgique, CNRS

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1997年 / 144卷 / 12期

关键词：

D O I：

10.1149/1.1838149

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

A method is described which allows in situ simultaneous measurement of mass changes and stress level during electrodeposition of nanometric films using the double quartz crystal method. The method is applied to Cu/FeNi electrodeposited multilayers. Compressive stresses are observed during the first stages of the electrodeposition of FeNi alloys. large tensile stresses are observed for thicker FeNi layers. The work confirms the stress reducing effect of the copper layers.

引用

页码：L328 / L330

页数：3

共 26 条

[1]

ABERMANN R, 1992, MATER RES SOC SYMP P, V239, P25, DOI 10.1557/PROC-239-25

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