Electronic properties of nanostructures defined in Ga[Al]As heterostructures by local oxidation

被引:74
作者
Fuhrer, A [1 ]
Dorn, A
Lüscher, S
Heinzel, T
Ensslin, K
Wegscheider, W
Bichler, M
机构
[1] Swiss Fed Inst Technol, Solid State Phys Lab, CH-8093 Zurich, Switzerland
[2] Univ Regensburg, Inst Angew & Expt Phys, D-93040 Regensburg, Germany
[3] Tech Univ Munich, Walter Schottky Inst, D-85748 Garching, Germany
关键词
atomic force lithography; semiconductor nanostructures; 2DEG;
D O I
10.1006/spmi.2002.1015
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Semiconductor nanostructures are fabricated by local oxidation of Ga[Al]As heterostructures with an atomic force microscope (AFM). The GaAs surface is locally oxidized by applying a bias between the substrate and a conductive AFM tip in a humidity-controlled environment. For high-quality two-dimensional electron gases (2DEGS) located close enough to the sample surface the electrons get depleted below the oxidized regions. This way the plane of a 2DEG can be cut into various conductive areas which are laterally insulated from each other. The realization of several high-quality semiconductor nanostructures is demonstrated. I. Quantum wires are fabricated with smooth and steep potential. II. Quantum dots tuned by in-plane gate electrodes can be operated in the regime, where electrons tunnel sequentially through individual quantum levels. III. Antidot superlattices with high-precision lattice parameters display characteristic features of classical and quantum transport. (C) 2002 Elsevier Science Ltd. All rights reserved.
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页码:19 / 42
页数:24
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