Thermodynamic properties of the Si-SiO2 system

被引:11
作者
Capron, N
Boureau, G
Pasturel, A
Hafner, J
机构
[1] Univ Paris 06, Lab Chim Phys Mat & Rayonnement, F-75231 Paris 05, France
[2] CNRS, Lab Phys Numer, F-38042 Grenoble, France
[3] Univ Vienna, Inst Mat Phys, A-1090 Vienna, Austria
[4] Univ Vienna, Ctr Computat Mat Sci, A-1090 Vienna, Austria
关键词
D O I
10.1063/1.1485730
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, using the density functional theory, we present a consistent study of the thermodynamics of the Si-SiO2 system. This includes the formation of oxygen interstitials in silicon and of oxygen vacancies in silicon dioxide (cristobalite). Relations between calculated and measured quantities are analyzed. The composition dependence of the Si-Si and Si-O bond energies are discussed, which has implications on the modeling of the Si-SiO2 interface. (C) 2002 American Institute of Physics.
引用
收藏
页码:1843 / 1850
页数:8
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