Femtosecond- and nanosecond-pulse laser ablation of bariumalumoborosilicate glass

被引:55
作者
Rudolph, P [1 ]
Bonse, J [1 ]
Krüger, J [1 ]
Kautek, W [1 ]
机构
[1] Fed Inst Mat Res & Testing, Lab Thin Film Technol, D-12205 Berlin, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 69卷 / Suppl 1期
关键词
D O I
10.1007/s003390051524
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser ablation with femtosecond pulses (130 fs, wavelength 800 nm, repetition rate 2 Hz) was compared with nanosecond-pulse ablation (10 ns, wavelength 266 nm, repetition rate 2.5 Hz) of bariumalumoborosilicate glass in air using the direct focusing technique. Different ablation thresholds and heat-affected zones were observed. The lateral and vertical machining precision was evaluated. Single nanosecond laser pulses in the far UV resulted in a bubble or a circular hole in the centre of the illuminated spot, depending on the applied fluence. The ablation behaviour in the case of near-IR femtosecond pulses contrasted to this. Bubble formation was not detected. It needed repeated pulses at the same spot to modify the surface until material removal could be observed (incubation). Cavity dimensions of less than the beam diameter were achieved in this case.
引用
收藏
页码:S763 / S766
页数:4
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