Fe-C-N oxygen reduction catalysts prepared by combinatorial sputter deposition

被引：48

作者：

Easton, E. Bradley ^{[1
]}

Bonakdarpour, Arman

Dahn, J. R.

机构：

[1] Dalhousie Univ, Dept Phys, Halifax, NS B3H 3J5, Canada

[2] Dalhousie Univ, Dept Chem, Halifax, NS B3H 3J5, Canada

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2006年 / 9卷 / 10期

关键词：

D O I：

10.1149/1.2266157

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Thin-film libraries of FexC1-x-yNy libraries (0 < x < 0.12; 0 < y < 0.5) have been prepared by combinatorial sputter deposition. The libraries were subsequently annealed at 700, 800, and 1000 degrees C to induce structural and compositional changes. Respectable catalytic activity was achieved with libraries having 0 < x < 0.035 and 0.01 < y < 0.16 that were annealed at 800 degrees C. This is explained in terms of nitrogen content and the degree of graphitization of the annealed catalysts. (c) 2006 The Electrochemical Society.

引用

页码：A463 / A467

页数：5

共 20 条

[1] RRDE study of oxygen reduction on Pt nanoparticles inside Nafion®:: H2O2 production in PEMFC cathode conditions
Antoine, O
Durand, R
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 2000, 30 (07) : 839 - 844
[2] Recent developments in polymer electrolyte fuel cell electrodes
Antolini, E
[J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 2004, 34 (06) : 563 - 576
[3] ATANASOSKI RT, 2006, 2006 US DOE ANN MER
[4] ATANASOSKI RT, 2005, INT C NEW PROT COND
[5] Economical sputtering system to produce large-size composition-spread libraries having linear and orthogonal stoichiometry variations
Dahn, JR
Trussler, S
Hatchard, TD
Bonakdarpour, A
Mueller-Neuhaus, JR
Hewitt, KC
Fleischauer, M
[J]. CHEMISTRY OF MATERIALS, 2002, 14 (08) : 3519 - 3523
[6] Sputtered cobalt-carbon-nitrogen thin films as oxygen reduction electrocatalysts - I. Physical and electrochemical characterization
Deng, CZ
Dignam, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (10) : 3507 - 3512
[7] Sputtered cobalt-carbon-nitrogen thin films as oxygen reduction electrocatalysts - II. Electrochemical stability and proposed mechanism
Deng, CZ
Dignam, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1998, 145 (10) : 3513 - 3520
[8] Preparation and characterization of sputtered Fe1-xNx films
Easton, EB
Buhrmester, T
Dahn, JR
[J]. THIN SOLID FILMS, 2005, 493 (1-2) : 60 - 66
[9] EASTON EB, UNPUB ELECTROCHEM SO
[10] Thermal stability of carbon nitride thin films
Hellgren, N
Lin, N
Broitman, E
Serin, V
Grillo, SE
Twesten, R
Petrov, I
Colliex, C
Hultman, L
Sundgren, JE
[J]. JOURNAL OF MATERIALS RESEARCH, 2001, 16 (11) : 3188 - 3201

← 1 2 →