Determination of pore size distribution in thin films by ellipsometric porosimetry

被引:505
作者
Baklanov, MR
Mogilnikov, KP
Polovinkin, VG
Dultsev, FN
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Russian Acad Sci, Inst Semicond Phys, SB, Novosibirsk 630090, Russia
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 03期
关键词
D O I
10.1116/1.591390
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We show that ellipsometric ic porosimetry can be used for the measurement of the pore size distribution in thin porous films deposited on top of any smooth solid substrate. In this method, in situ ellipsometry is used to determine the amount of adsorptive, which is adsorbed/condensed in the film. Changes in refractive index and film thickness are used to calculate the quantity of adsorptive present in the film. Room temperature porosimetry based on adsorption of vapor of organic solvents has been developed. In this article, a method of calculation of pore size distribution and results of measurements on mesoporous and microporous xerogel films is discussed. Examination of the validity of the Gurvitsch rule fur various organic adsorptives (toluene, heptane, and carbon tetrachloride) is carried out to assess the reliability of measurements of pore size distributions by ellipsometric porosimetry. (C) 2000 American Vacuum Society. [S0734-211X(00)06503-3].
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页码:1385 / 1391
页数:7
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