Plasma-assisted atomic layer deposition of Al2O3 moisture permeation barriers on polymers

被引：218

作者：

Langereis, E. ^{[1
]}

Creatore, M. ^{[1
]}

Heil, S. B. S. ^{[1
]}

van de Sanden, M. C. M. ^{[1
]}

Kessels, W. M. M. ^{[1
]}

机构：

[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands

来源：

APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 08期

关键词：

D O I：

10.1063/1.2338776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin Al2O3 films of different thicknesses (10-40 nm) were deposited by plasma-assisted atomic layer deposition on substrates of poly(2,6-ethylenenaphthalate) (PEN), and the water vapor transmission rate (WVTR) values were measured by means of the calcium test. The permeation barrier properties improved with decreasing substrate temperature and a good WVTR of 5x10(-3) g m(-2) day(-1) (WVTRPEN=0.5 g m(-2) day(-1)) was measured for a 20 nm thick Al2O3 film deposited at room temperature using short purging times. Such ultrathin, low-temperature deposited, high-quality moisture permeation barriers are an essential requirement for the implementation of polymeric substrates in flexible electronic and display applications.

引用

页数：3

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