Atomically resolved scanning tunneling microscopy of hydrogen-terminated Si(001) surfaces after HF cleaning

被引：39

作者：

Arima, K ^{[1
]}

Endo, K ^{[1
]}

Kataoka, T ^{[1
]}

Oshikane, Y ^{[1
]}

Inoue, H ^{[1
]}

Mori, Y ^{[1
]}

机构：

[1] Osaka Univ, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan

来源：

APPLIED PHYSICS LETTERS | 2000年 / 76卷 / 04期

关键词：

D O I：

10.1063/1.125788

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Atomic structures of hydrogen-terminated Si(001) surfaces after HF cleaning are investigated by scanning tunneling microscopy. It is revealed that the surface is macroscopically rough but is composed of terraces and steps. Inside a terrace, 1x1 structures are formed. This corresponds to the ideal 1x1 dihydride structure. The step edges run along the < 110 > direction. On the other hand, the 1x1 dihydride structure disappears when the surface is subsequently rinsed with ultrapure water, because every other dihydride row of the ideal 1x1 structure is preferentially etched in ultrapure water. (C) 2000 American Institute of Physics. [S0003- 6951(00)03604-4].

引用

页码：463 / 465

页数：3

共 12 条

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