Appearance potential mass spectrometry: Discrimination of dissociative ionization products

被引:90
作者
Singh, H [1 ]
Coburn, JW [1 ]
Graves, DB [1 ]
机构
[1] Univ Calif Berkeley, Dept Chem Engn, Berkeley, CA 94720 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2000年 / 18卷 / 02期
关键词
D O I
10.1116/1.582183
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Appearance potential mass spectrometry (APMS) has recently gained importance for detection and quantitative measurements of reactive radical species in plasmas using line-of-sight sampling of radicals. In this work, we have investigated the assumption that the extraction efficiency of ions produced by direct ionization of radicals, and ions produced by dissociative ionization of the parent molecule used as the reference signal, are equal in the ionizer of the mass spectrometer. We find that the dissociative ionization products are extracted with much lower efficiency (2-50 times smaller for the cases studied) than the direct ionization products. This is expected due to the excess kinetic energy of the dissociatively ionized products as a result of the Franck-Condon effect. Use of this procedure will thus lead to an overestimation of the radical number density by a factor of 2-50, depending on the nature of the parent and the daughter ion. We recommend an alternate procedure for APMS that utilizes an inert gas direct ionization signal as a reference for calibration of the radical signal to calculate the radical number density. The biggest uncertainty in the radical number density estimation with the recommended procedure is expected to be the uncertainty in the published cross sections. (C) 2000 American Vacuum Society. [S0734-2101(00)08602-4].
引用
收藏
页码:299 / 305
页数:7
相关论文
共 27 条
[1]   ELECTRON-IMPACT IONIZATION AND DISSOCIATIVE IONIZATION OF THE CD3 AND CD2 FREE-RADICALS [J].
BAIOCCHI, FA ;
WETZEL, RC ;
FREUND, RS .
PHYSICAL REVIEW LETTERS, 1984, 53 (08) :771-774
[2]   RECOMMENDED DATA ON THE ELECTRON-IMPACT IONIZATION OF LIGHT-ATOMS AND IONS [J].
BELL, KL ;
GILBODY, HB ;
HUGHES, JG ;
KINGSTON, AE ;
SMITH, FJ .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1983, 12 (04) :891-916
[3]   Electron interactions with CF4 [J].
Christophorou, LG ;
Olthoff, JK ;
Rao, MVVS .
JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1996, 25 (05) :1341-1388
[5]   Mass spectrometric measurements of neutral reactant and product densities during Si etching in a high-density helical resonator Cl-2 plasma [J].
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 1996, 79 (12) :9353-9360
[6]   MEASUREMENTS OF ELECTRON-IMPACT-IONIZATION CROSS-SECTIONS OF N2, CO, CO2, CS, S2, CS2, AND METASTABLE N2 [J].
FREUND, RS ;
WETZEL, RC ;
SHUL, RJ .
PHYSICAL REVIEW A, 1990, 41 (11) :5861-5868
[7]   Formation of cationic silicon clusters in a remote silane plasma and their contribution to hydrogenated amorphous silicon film growth [J].
Kessels, WMM ;
Leewis, CM ;
van de Sanden, MCM ;
Schram, DC .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (07) :4029-4039
[8]   The recombination of chlorine atoms at surfaces [J].
Kota, GP ;
Coburn, JW ;
Graves, DB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (01) :270-277
[9]   CROSS-SECTIONS FOR THE PRODUCTION OF N-2+, N+ + N22+ AND N-2+ BY ELECTRON-IMPACT ON N-2 [J].
KRISHNAKUMAR, E ;
SRIVASTAVA, SK .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1990, 23 (11) :1893-1903
[10]   CROSS-SECTIONS FOR ELECTRON-IMPACT IONIZATION OF O2 [J].
KRISHNAKUMAR, E ;
SRIVASTAVA, SK .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1992, 113 (01) :1-12