Properties of fluoride DUV-excimer laser optics:: Influence of the number of dielectric layers

被引:6
作者
Arens, W [1 ]
Ristau, D [1 ]
Ullmann, J [1 ]
Zaczek, C [1 ]
Thielsch, R [1 ]
Kaiser, N [1 ]
Duparré, A [1 ]
Apel, O [1 ]
Mann, K [1 ]
Lauth, H [1 ]
Bernitzki, H [1 ]
Ebert, J [1 ]
Schippel, S [1 ]
Heyer, H [1 ]
机构
[1] Laser Zentrum Hannover, D-30419 Hannover, Germany
来源
LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1999 | 2000年 / 3902卷
关键词
DUV coatings; fluoride films; multi-layer coatings; optical properties; scatter; radiation resistance; LIDT; stress; 193; nm;
D O I
10.1117/12.379314
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The key technologies for modem production processes with enhanced spatial resolution, require high performance DUV-excimer laser optics with enhanced optical properties. Major challenges imposed onto the requested new generation of optical elements are concentrated on lowest absorption and scattering as well as stability against highest pulse number throughput. These targets are the driving force within the German Joint Research Project "OPUS II", which is dedicated to the development of high quality optical components for the DUV spectral range(1). As a major contribution to these investigations, sets of reflecting stacks with four different numbers of layer pairs of LaF3/MgF2 were produced by 6 partners of the consortium and characterized in respect to their optical performance and structural properties. The characterization includes spectrophotometric measurements from the VUV up to the mid infrared range, calorimetric absorption measurements at 193 nm, and a comparative study in total scatter behavior at 193 nm, which was performed by three laboratories within the project. Also, besides the intrinsic stress and the surface topography of the layers, the non-linear absorption behavior of selected samples have been determined. The results are presented and discussed with respect to possible applications.
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页码:250 / 259
页数:10
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