The critical role of hydrogen for physical sputtering with Ar-H2 glow discharges

被引：35

作者：

Budtz-Jorgensen, CV ^{[1
]}

Kringhoj, P ^{[1
]}

Bottiger, J ^{[1
]}

机构：

[1] Univ Aarhus, Inst Phys & Astron, DK-8000 Aarhus C, Denmark

来源：

SURFACE & COATINGS TECHNOLOGY | 1999年 / 116卷

关键词：

argon; DC pulsed; energy distribution; glow discharge; hydrogen; sputtering;

D O I：

10.1016/S0257-8972(99)00126-7

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The physical sputtering of gold surfaces by argon-hydrogen pulsed direct-current glow discharges has been measured for various gas compositions, and an optimum has been found at 5-20% H-2. Furthermore, the energy distributions of the ions hitting the cathodic surface have been measured and correlated to the sputtering rates using known sputtering-yield curves. It was found that the largest contribution to the ion sputtering originated from ArH+, the fluxes and energies of Ar+ being significantly smaller than for ArH+. (C) 1999 Elsevier Science S.A. All rights reserved.

引用

页码：938 / 943

页数：6

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