A prelude to surface chemical reaction: Imaging the induction period of sulfur interaction with a strained Cu layer

被引:24
作者
Hrbek, J [1 ]
de la Figuera, J
Pohl, K
Jirsak, T
Rodriguez, JA
Schmid, AK
Bartelt, NC
Hwang, RQ
机构
[1] Brookhaven Natl Lab, Dept Chem, Upton, NY 11973 USA
[2] Sandia Natl Labs, Surface Chem Dept, Livermore, CA 94551 USA
关键词
D O I
10.1021/jp992564z
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The induction period of the chemical reaction between Cu and S was visualized with STM, revealing a complex interplay between strain relief and reaction mechanism. Copper sulfide formation, monitored by high-resolution soft X-ray photoemission, started only after adsorption of similar to 0.2 ML of S on a two-atom thick Cu layer supported by a Ru(0001) substrate. The pre-sulfide stages of sulfur interaction were investigated by in situ STM. Sulfur decorated the Cu surface by adsorbing at pseudo it-fold hollow sites pf the striped Cu phase and restructured the Cu layer to create additional adsorption sites of this type. Several self-organized structures of adsorbed S on the dynamically responding strained Cu layer were observed. Significant structural changes of both adsorbate and adsorbent occurred within the induction period of this surface chemical reaction.
引用
收藏
页码:10557 / 10561
页数:5
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