Amorphous films at metal/ceramic interfaces

被引：21

作者：

Avishai, A

Scheu, C

Kaplan, WD ^{[1
]}

机构：

[1] Technion Israel Inst Technol, Dept Mat Engn, IL-32000 Haifa, Israel

[2] Max Planck Inst Met Res, Stuttgart, Germany

来源：

ZEITSCHRIFT FUR METALLKUNDE | 2003年 / 94卷 / 03期

关键词：

metal/alumina interfaces; intergranular amorphous films; transmission electron microscopy;

D O I：

10.3139/146.030272

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

The interface chemistry and structure of two metal/ceramic composites was investigated using analytical and high-resolution transmission electron microscopy. Cu and Ni alumina composites were prepared and doped with predetermined amounts of Ca and Si additions to obtain a glass phase during sintering. The Si and Ca additions resulted in the formation of glass pockets at triple junctions and intergranular films at the alumina grain boundaries and the metal/alumina interfaces. A variation in the thickness and chemistry of the film at the metal/alumina interface was observed between the two composites. The formation of intergranular films and their presence at metal/alumina interfaces of occluded particles indicate that the intergranular films are probably stable.

引用

页码：272 / 276

页数：5

共 23 条

[1] Improved quantification of grain boundary segregation by EDS in a dedicated STEM [J].