Fabrication of photonic crystals by deep x-ray lithography

被引:121
作者
Feiertag, G
Ehrfeld, W
Freimuth, H
Kolle, H
Lehr, H
Schmidt, M
Sigalas, MM
Soukoulis, CM
Kiriakidis, G
Pedersen, T
Kuhl, J
Koenig, W
机构
[1] IOWA STATE UNIV,AMES LAB,AMES,IA 50011
[2] IOWA STATE UNIV,DEPT PHYS & ASTRON,AMES,IA 50011
[3] FDN RES & TECHNOL HELLAS,IRAKLION,CRETE,GREECE
[4] MAX PLANCK INST FESTKORPERFORSCH,D-70506 STUTTGART,GERMANY
关键词
D O I
10.1063/1.120431
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have developed a new microfabrication technique for the construction of three-dimensional photonic crystals. In particular, we used multiple tilted x-ray lithography exposures in order to construct structures with photonic band gaps in the infrared region. First polymethylmethacrylate (PMMA) resist layers with a thickness of 500 mu m were irradiated, then the holes in the resist structure were filled with preceramic polymer and subsequent pyrolysis converts the preceramic polymer into a SiCN ceramic. Theoretical results with fitted values of the dielectric constant are in good agreement with the transmission measurements. (C) 1997 American Institute of Physics.
引用
收藏
页码:1441 / 1443
页数:3
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