Enhanced antiferromagnetic exchange coupling in Fe/Si/Fe epitaxial trilayers with Fe0.5Si0.5 boundary layers

被引：25

作者：

Gareev, RR ^{[1
]}

Bürgler, DE ^{[1
]}

Buchmeier, M ^{[1
]}

Schreiber, R ^{[1
]}

Grünberg, P ^{[1
]}

机构：

[1] Forschungszentrum Julich GmbH, Inst Festkorperforsch, D-52425 Julich, Germany

来源：

APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 07期

关键词：

Antiferromagnetic exchange coupling - Brillouin light scattering - Co-evaporations - Interlayer coupling - Magneto-optic Kerr effect - Spacer thickness - Trilayers;

D O I：

10.1063/1.1499229

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Epitaxial Fe/Fe0.5Si0.5/Si-wedge/Fe0.5Si0.5/Fe structures are prepared by thermal evaporation with Fe0.5Si0.5 boundary layers grown by coevaporation at 200 degreesC. Magnetic properties are examined with Brillouin light scattering and longitudinal magneto-optic Kerr effect hysteresis. The interlayer coupling is found to increase in excess of 8 mJ/m(2) by introducing a boundary layer at the bottom interface. The coupling maximum shifts from 7 to 3 A nominal Si thickness. This effect is related to reduced interdiffusion with the formation of an epitaxial, pinhole-free spacer at smaller thickness. Together with the strong increase of the coupling for decreasing spacer thickness, this results in an enhancement of the coupling. (C) 2002 American Institute of Physics.

引用

页码：1264 / 1266

页数：3

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